منابع مشابه
Gas and Vacuum Carburizing
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Tungsten carbide (WCx) thin films were prepared by plasma-assisted atomic layer deposition ALD using bis tertbutylimido bis dimethylamido tungsten at 250°C. The effects of plasma pulse time, radio frequency power, and the N2 /H2 ratio on the film properties, such as resistivity, surface roughness, step coverage, and stability in air, were examined. The film growth rate thickness/cycle was in th...
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ژورنال
عنوان ژورنال: Journal of the Surface Finishing Society of Japan
سال: 1992
ISSN: 0915-1869,1884-3409
DOI: 10.4139/sfj.43.154